Maskmaking/ E-Beam Lithographic Operations
The E-Beam Lithographic Operations of Northrop Grumman's Advanced Technology Center are located within minutes of the Baltimore-Washington Airport in Baltimore, Maryland. This DoD-secure, ISO-9001-certified facility has been delivering on-time quality photomasks to our internal and external customers for more than 25 years and is available to help you with your specific photomask requirements.
More than 150,000 photomasks have been produced and used in our in-house Silicon and Gallium Arsenide fabrication lines to deliver state-of-the-art microelectronic devices and integrated circuits including:
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microwave,
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radiation hardened,
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mixed signal, very low-power/high-speed analog ADCs,
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ASICs, and
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CCDs for high-value-added system insertion leverage.
We offer a capability that can satisfy your most stringent technical requirements with fast turnaround at a very competitive price.
In addition to complete or specific maskmaking services, we also offer custom graphics and design services as well as an established Direct Write-on-a-Wafer Capability. See our brochure for details.
Why should you make us your supplier of choice?
Price
We offer very competitive prices, providing small businesses with incentives normally enjoyed only by large companies.
Fast Turnaround
For the first three mask layers, we provide two-day turnaround from the receipt and acceptance of the order.
Quality
We guarantee every mask to meet your specifications or we will replace it, no questions asked.
People
Dedication and team spirit set us apart from other mask houses. Working together as a Self-Directed Work Team with more than 150 years of combined experience in the production of high quality photomasks, we have thrived while others have failed in this very competitive marketplace.